- Database
- Experimentalists
- Date
- 1991-07-01
- Thickness
- 7.85 $\pm$ 0.08 ${\mu}m$
- Diameter
- 20000.0 ${\mu}m$
- Volume
- 2400.0 $micron^3$
- Surface roughness
- very low
- Substrate material
- Polyethylene High Density window
- Substrate comments
- disk diameter 25mm, thickness 2mm
- Comments
- Thin film - 3rd deposition at 143K, and then cooled (80K) and heated during spectra recording (from 80K to 160K)
- Temperature
- 80.0 $\pm$ 0.5 $K$
- Time at T
- 10.0 $min$
- Temperature max
- 143.0 $\pm$ 0.5 $K$
- Time at Tmax
- 10.0 $min$
- Type
- vacuum
- Fluid pressure
- 1.0e-12 $\pm$ 1.0e-12 $bar$
- Comments
- residual UHV vacuum gases
- Number
- 1
- Layers
-
- H2O crystalline ice - deposition 145K - film 7.85µm , 7.85 ${\mu}m$
- Title
- Formation of solid crystalline ice phase
- Matters
- Sample
- H2O crystalline ice - deposition 143K - film 7.85µm (this sample)
- Processing steps
-
Step Chronology Date Type Process Changes #1 before layer formation 1991-07-01 fluid physical several freeze-thawn cycles of liquid H2O under dynamic primary vacuum (pumping) removing of air and some CO2 gas; most air but only part of CO2 is removed] #2 before layer formation 1991-07-01 fluid physical evaporation at ~20°C of liquid H2O from liquid to gas phase] #3 during layer formation 1991-07-01 layer formation room T H2O gas deposited at low flux at 143K under vacuum from gas to solid crystalline ice phase]