H2O crystalline ice - deposition 145K | GhoSST | SSHADE

Processing math: 100%

Sample

Name: H2O crystalline ice - deposition 145K

Owner of sample

Database

GhoSST

Experimentalists

Origin of sample

Date: 1995-11-12

Physical characteristics

Thickness: 0.74 $\pm$ 0.02 ${\mu}m$
Diameter: 20000.0 ${\mu}m$
Volume: 230.0 $micron^3$
Surface roughness: very low
Substrate material: CsI
Substrate comments: disk diameter 25mm, thickness 2mm
Comments: Thin film - 3rd deposition at 145K, and then cooled during spectra recording (from 145K to 17K)

Sample environment: Temperature

Temperature: 60.0 $\pm$ 0.1 $K$
Time at T: 12.0 $min$
Temperature max: 145.0 $\pm$ 0.1 $K$
Time at Tmax: 12.0 $min$

Sample environment: Fluid

Type: vacuum
Fluid pressure: 1.0e-12 $\pm$ 1.0e-12 $bar$
Comments: residual UHV vacuum gases

Documentation and publication

Publications

Trotta, 1996, 1 - 220

Layers in sample

Number

1

Layers

H2O crystalline ice - film 0.74µm , 0.74 ${\mu}m$

Sample processings

Title

Formation of solid crystalline ice phase

Precursors

Matters

H2O liquid - deionized

Produced sample

Sample

H2O crystalline ice - deposition 145K (this sample)

Processing steps

Step	Chronology	Date	Type	Process	Changes
#1	before layer formation	1995-11-12	fluid physical	several freeze-thawn cycles of liquid H2O under dynamic primary vacuum (pumping)	removing of air and some CO2 gas;most air but only part of CO2 is removed]
#2	before layer formation	1995-11-12	fluid physical	evaporation at ~20°C of liquid H2O	from liquid to gas phase]
#3	during layer formation	1995-11-12	layer formation	room T H2O gas deposited at low flux at 145K under vacuum	from gas to solid crystalline ice phase]