Layer
Name
Layer #1
Type of layer
compact
Thickness
520.0  ± 15.0  nm
Texture
compact poor grained
Type of porosity
unknown
Formation mode
single gas deposition
Temperature
25.0  ± 5.0  K
Pressure
1e-08  ± 1e-08  None
Rate
0.185 +- 0.01 nm.s-1
Comments
Thin film deposited under vacuum from slow molecular flow of CO gas with 1 deposition tube at 45° incidence with the CsI substrate
Number
1
Arrangement
single material
Materials
  Name Arrangement Mass (g) Mass fraction Abundance comments
CO ice 1.0