Layer
Name
Layer #1
Type of layer
compact
Thickness
440.0  ± 15.0  nm
Texture
compact poor grained
Type of porosity
unknown
Formation mode
single gas deposition
Temperature
25.0  ± 5.0  K
Rate
0.04 ± 0.006 nm.s1
Fluid pressure
1.0e-08  ± 1.0e-08  mbar
Comments
Thin film deposited under vacuum on CsI substrate from slow molecular flow of CO gas with 1 deposition tube at 45° incidence
Number
1
Arrangement
single material
Materials
  Name Arrangement Mass (g) Mass fraction Abundance comments
CO ice 1.0