- Database
- Experimentalists
- Date
- 2004-11-04
- Thickness
- 28.0 $\pm$ 20.0 $nm$
- Substrate material
- gold plated copper surface
- Temperature
- 10.0 $\pm$ 0.2 $K$
- Temperature max
- 12.0 $K$
- Type
- vacuum
- Fluid pressure
- 1.0e-08 $hPa$
- Number
- 1
- Layers
-
- Layer #1 , 28.0 $nm$
- Title
- vapor deposition
- Sample
- Formamide (HCONH2) amorphous deposited at 10K (this sample)
- Processing steps
-
Step Chronology Date Type Process Changes #1 before layer formation thermal evaporation of formamide #2 before layer formation layer formation freezing of gas-phase formamide