- Database
- Experimentalists
- Date
- 1995-11-12
- Diameter
- 20000.0 ${\mu}m$
- Surface roughness
- very low
- Substrate material
- CsI
- Substrate comments
- disk diameter 25mm, thickness 2mm
- Comments
- Thin film - deposition at 15K
- Temperature
- 15.0 $\pm$ 1.0 $K$
- Time at T
- 10.0 $min$
- Temperature max
- 15.0 $\pm$ 1.0 $K$
- Time at Tmax
- 12.0 $min$
- Type
- vacuum
- Fluid pressure
- 1.0e-12 $\pm$ 1.0e-12 $bar$
- Comments
- residual UHV vacuum gases
- Publications
- Number
- 1
- Layers
- Title
- condensation of amorphous H2O ice
- Matters
- Sample
- H2O amorphous ice - deposition 15K (this sample)
- Processing steps
-
Step Chronology Date Type Process Changes #1 before layer formation 1995-11-12 fluid physical several freeze-thawn cycles of liquid H2O under dynamic primary vacuum (pumping) removing of air and some CO2 gas #2 before layer formation 1995-11-12 fluid physical evaporation at ~20°C of liquid H2O from liquid to gas phase #3 during layer formation 1995-11-12 layer formation room T H2O gas deposited at low flux at 15K under vacuum from gas phase to solid amorphous ice phase