- Database
- Experimentalists
- Date
- 1994-01-01
- Surface roughness
- very low
- Substrate material
- MgF2
- Comments
- Generic sample of experiments with different thicknesses
- Temperature
- 125.0 $\pm$ 1.0 $K$
- Type
- vacuum
- Number
- 1
- Layers
- Title
- Crystallization of SO2 solid phase
- Matters
- Sample
- SO2 crystalline (this sample)
- Processing steps
-
Step Chronology Date Type Process Changes #1 during layer formation 1994-01-01 layer formation thin films formed by direct gas deposition at 35K under vacuum - crystal formed by crystallization at 197.64K from gas to crystalline SO2 phase I