CH4 crystalline II - film 0.775µm | GhoSST | SSHADE

Processing math: 100%

Sample

Name: CH4 crystalline II - film 0.775µm

Owner of sample

Database

GhoSST

Experimentalists

Origin of sample

Date: 1995-04-25
Parent sample: CH4 crystalline II - film 0.545µm

Physical characteristics

Thickness: 0.775 $\pm$ 0.015 ${\mu}m$
Diameter: 20000.0 ${\mu}m$
Volume: 240000000.0 $micron^3$
Surface roughness: very low
Substrate material: CsI
Substrate comments: window 2mm thick
Comments: Thin film - 3rd deposition

Sample environment: Temperature

Temperature: 15.0 $\pm$ 0.5 $K$
Temperature max: 15.0 $\pm$ 0.5 $K$

Sample environment: Fluid

Type: vacuum

Documentation and publication

Publications

Trotta, 1996, 1 - 220

Layers in sample

Number

1

Layers

CH4 crystalline II - film 0.775µm , 0.775 ${\mu}m$