Sample
Name
NO2 crystalline
Date
1999-01-01
Surface roughness
very low
Substrate material
MgF2
Temperature
100.0 ± 0.5 K
Temperature max
100.0 ± 0.5 K
Title
Crystallization of NO2 solid phase

Precursors

Matters

Produced sample

Sample
NO2 crystalline (this sample)
Processing steps
Step Chronology Date Type Process Changes
#1 during layer formation 1999-01-01 layer formation Thin film deposited at 100K under vacuum from slow molecular flow of NO2 gas from gas to solid phase