- Database
- Experimentalists
- Date
- 2007-01-01
- Provider
- IPAG
- Thickness
- 1.0 $\pm$ 0.05 $mm$
- Diameter
- 30.0 $mm$
- Volume
- 700.0 $mm^3$
- Surface roughness
- low
- Substrate material
- aluminum anodized black
- Substrate comments
- diameter 30 mm, depth 1 mm
- Comments
- Mass of dry sample = 0.688g - used as martian analogue dust
- Temperature
- 243.1 $\pm$ 0.5 $K$
- Temperature max
- 443.0 $K$
- Time at Tmax
- 600.0 $min$
- Comments
- Sample temperature error is mostly due to possible vertical temperature gradient in the sample. Temperature reading accuracy and stability is 0.1K
- Type
- vacuum
- Fluids
-
- Secondary vacuum - ~1e-6 mbar 100.0 %
- Fluid temperature
- 243.0 $\pm$ 5.0 $K$
- Fluid pressure
- 1.0e-06 $\pm$ 1.0e-06 $mbar$
- Comments
- P/Ps = 0.000003 +/- 0.000003 - Fluid temperature error depicts estimated thermal gradient of gas in the cell
- Number
- 1
- Layers
-
- Volcanic tuff with H2O , 1.0 $mm$
- Title
- removal of adsorbed/interlayer water in sample by pumping and heating
- Matters
- Sample
- Volcanic tuff with 0.29% adsorbed H2O (this sample)
- Processing steps
-
Step Chronology Date Type Process Changes #1 after layer formation 2007-01-01 mechanical sample slightly packed with a tamper to obtain a smooth surface with limited powder compaction under ambiant condition limited compaction of the surface #2 after sample formation 2007-01-01 thermal the sample is heated at 443 K following a temperature ramp of 1 h while the chamber is open to air. After 1 h at 443 K, the chamber is closed and heating stops. Sample temperature decreases for a few hours to reach the temperature of the cold room (263 K). removing of adsorbed/interlayer H2O #3 after sample formation 2007-01-01 fluid physical simulation chamber is slowly pumped down to pressure lower than $10^{-6}$ mbar removing of adsorbed/interlayer $H_2O$. Air to vacuum (mostly residual $H_2O$ from sample) #4 after sample formation 2007-01-01 thermal under secondary vacuum, the sample is heated again at 446 K during a minimum of 10 h removing of adsorbed/interlayer $H_2O$