SiS_2, amorphous | DOCCD | SSHADE

Sample

Name: SiS$_2$, amorphous

Owner of sample

Database

DOCCD

Experimentalists

Origin of sample

Date: 1995-01-01

Physical characteristics

Thickness: 0.2 $mm$
Diameter: 8.0 $mm$
Comments: The sample surface has the cylindrical shape of the silica tube (inner radius 4 mm) in which it was solidified.

Sample environment: Temperature

Temperature: 300.0 $\pm$ 5.0 $K$
Temperature max: 300.0 $K$

Sample environment: Fluid

Type: ambient air
Fluid temperature: 300.0 $K$
Fluid pressure: 1000.0 $mbar$

Documentation and publication

Publications

Begemann et al., 1996, Astrophys. J., 464, L195 - L198

Layers in sample

Number

1

Layers

SiS$_2$, amorphous , 0.2 $mm$

Sample processings

Title

Preparation of the SiS$_2$ sample

Produced sample

Sample

SiS$_2$, amorphous (this sample)

Processing steps

Step	Chronology	Date	Type	Process	Changes
#1	before layer formation	1996-01-01	mixing	Mixing and homogenization of 0.6 g sulfur and 0.2628 g silicon and subsequent sealing of the mixture in a quartz tube with 8 mm inner diameter (under vacuum)
#2	before layer formation	1996-01-01	thermal	Gradually heating to 1373 K and holding the temperature constant for 60 hours for melting the mixture
#3	during layer formation	1996-01-01	thermal	Quenching of the melt by dropping the hot tube directly from furnace into water	transparent SiS$_2$ glass was formed at the wall in the center of the tube
#4	after layer formation	1996-01-01	mechanical	Mounting of the glassy sample under argon atmosphere on a special sample holder for infrared reflection measurements at curved surfaces (4 mm radius of curvature)