- Database
- Experimentalists
- Date
- 1996-03-18
- Diameter
- 20000.0 ${\mu}m$
- Substrate material
- CsI window, 2mm thick
- Substrate comments
- disk diameter 25mm
- Comments
- Thin film - deposition at 15K
- Temperature
- 15.0 $\pm$ 0.5 $K$
- Temperature max
- 15.0 $\pm$ 0.5 $K$
- Comments
- heating from 15K to 38K
- Type
- vacuum
- Fluid pressure
- 1.0e-12 $\pm$ 1.0e-12 $bar$
- Comments
- residual UHV vacuum gases
- Publications
- Number
- 1
- Layers
- Title
- Formation of amorphous CH3OH solid phase
- Matters
- Sample
- CH3OH amorphous - dep 15K - film ??µm (this sample)
- Processing steps
-
Step Chronology Date Type Process Changes #1 during layer formation 1996-01-01 layer formation liquid vaporized at room T under vacuum and then gas deposited at 15K under vacuum from CH3OH liquid to gas and to amorphous solid phase