Layer
Name
C2H6 crystalline - dep 15K
Type of layer
compact
Texture
compact poor grained
Porosity
0.0e+00 ± 0.05
Comments
very homogeneous and flat layer
Formation mode
single gas deposition
Temperature
15.0  ± 0.5  K
Rate
0.075 ± 0.25 µm/h
Comments
Thin film deposited under high vacuum from slow molecular flow of room T° C2H6 gas with 2 opposite deposition tubes at 40° incidence with micronic grid
Number
1
Arrangement
single material
Materials
  Name Arrangement Mass (g) Mass fraction Abundance comments
C2H6 crystalline 1.0