Layer
Name
Tholins Film for X-ray irradiation LATMOS 95%N2:5%CH4
Type of layer
compact
Thickness
1139.0  $\pm$ 42.0  $nm$
Texture
compact
Type of porosity
without pores
Comments
Homogeneous organic thin film.
Formation mode
manual deposition
Temperature
308.0  $\pm$ 15.0  $K$
Pressure
0.0009  $\pm$ 2e-05  $None$
Rate
0.12 nm.s-1
Comments
Formed using the PAMPRE experiment
Number
1
Arrangement
single material
Materials
  Name Arrangement Mass (g) Mass fraction Abundance comments
Tholins Film for X-ray irradiation LATMOS 95%N2:5%CH4 1.0