- Database
- Experimentalists
- Date
- 1995-04-25
- Parent sample
- CH4 crystalline II - film 0.775µm
- Thickness
- 1.2 ± 0.02 μm
- Diameter
- 20000.0 μm
- Volume
- 370000000.0 micron3
- Surface roughness
- very low
- Substrate material
- CsI
- Substrate comments
- window 2mm thick
- Comments
- Thin film - 4th deposition
- Temperature
- 15.0 ± 0.5 K
- Temperature max
- 15.0 ± 0.5 K
- Type
- vacuum
- Publications
- Number
- 1
- Layers
-
- CH4 crystalline II - film 1.20µm , 1.2 μm