- Database
- Experimentalists
- Date
- 1992-09-16
- Diameter
- 20000.0 ${\mu}m$
- Surface roughness
- very low
- Substrate material
- CsI
- Substrate comments
- disk diameter 25mm, thickness 2mm
- Temperature
- 56.0 $\pm$ 0.5 $K$
- Temperature max
- 56.0 $\pm$ 0.5 $K$
- Type
- vacuum
- Fluids
-
- ultra high vacuum - ~1e-9 mbar 100.0 %
- Fluid pressure
- 1.0e-08 $mbar$
- Publications
- Number
- 1
- Layers
- Title
- Deposition of H2S to amorphous solid phase
- Matters
- Sample
- H2S amorphous (this sample)
- Processing steps
-
Step Chronology Date Type Process Changes #1 during layer formation 1996-01-01 layer formation room T gas deposited at 56K under vacuum from H2S gas to amorphous solid phase